Plasma Etcher Tumi a Wɔayɛ no Ahintasɛm

Plasma Etcher Tumi Mfitiasesɛm
Tumi a plasma etcher wɔ no te sɛ kar a ɛma ɛyɛ ntɛmntɛm, na ɛkyerɛ ahoɔhare ne sɛnea wɔde etcher no mu dɔ tẽẽ. Dodow a tumi no kɔ soro no, dodow no ara na plasma no density yɛ kɛse na etching rate no yɛ ntɛmntɛm. Nanso, ɛnyɛ bere nyinaa na tumi a ɛkorɔn ye sen biara; ɛsɛ sɛ wogyina nneɛma ne ɔkwan a wɔfa so yɛ no ahwehwɛde ahorow so na ɛyɛ nsakrae.

Tumi a ɛba fam (100-300W): Ɛfata ma etching a ɛyɛ fɛ na ɛmma nneɛma sɛe koraa.

Tumi a ɛwɔ mfinimfini (300-600W): Ɛkari pɛ wɔ etch rate ne selectivity.

Tumi a ɛkorɔn (600W ne nea ɛboro saa): Wɔde yi nneɛma pii fi hɔ ntɛmntɛm.

Nkɛntɛnso a Tumi Nya wɔ Etching Nea Efi Mu Ba So

Nsakrae nketenkete a ɛba tumi mu no betumi ama nsonsonoe kɛse aba wɔ etching aba mu:

Etching rate: 100W biara a ɛkɔ soro wɔ ahoɔden mu no ma rate no kɔ soro bɛyɛ 15-20%.

Selectivity: Tumi a ɛboro so betumi atew ahobammɔ a ɛwɔ akataso no so.

Nneɛma a ɛyɛ pɛ: Tumi a ɛsakrasakra betumi ama etching bun a ɛnkɔ so pɛpɛɛpɛ aba.

Nneɛma a efi mu ba: Tumi ka plasma mu nnuru, na ɛsakra nneɛma a efi mu ba no ahorow.

Nneɛma Titiriw a Ɛwɔ Tumi a Wɔyɛ no Yiye Mu

Sɛnea ɛbɛyɛ a wobenya etching aba a eye sen biara no, ɛsɛ sɛ wosusuw nneɛma a edidi so yi ho:

Mframa ahorow: Mframa ahorow hwehwɛ tumi pɔtee bi.

Chamber pressure: Nhyɛso mu nsakrae hwehwɛ sɛ wɔyɛ ahoɔden mu nsakrae a ɛne no hyia.

Substrate temperature: Wobetumi atew tumi so bere a ɔhyew kɔ soro no.

Electrode ntam kwan: Dodow a ntam kwan no sua no, dodow no ara na ahoɔden a ɛho hia no sua.